Optional multiples: 2X, 3X, 5X, 10X, 20X

Optional coatings: UV, 355 nm, 532 nm, 1064 nm

High power design (UV fused silica substrate, high damage threshold anti-reflective coating, Galilean type and air-gap design)

Expansion/contraction of the diameter of the incident parallel beam by a certain multiple

Multiple M4 threaded holes for easy optical system integration

Low aberration, air-gap structure design

Expanding or reducing the diameter of incident parallel beams to a fixed multiple

Achromatic design with low aberration

Sliding lens adjustment ring (non-rotating lens), effectively reducing beam deviation

Expanding or reducing the diameter of incident parallel beams to a fixed magnification

Reflective design, achromatic, suitable for broadband light sources

High reflectivity across a wavelength range from 450 nm to 20 μm

UV fused silica lens set, integrated into the mechanical housing with Galilean structure

Optimized design for diffraction limit, no internal focus, high adjustment precision

It can be used to adjust the incident laser beam to different sizes and divergence angles

UV fused silica lens assembly, integrated into the mechanical housing with Galilean structure

Optimized design for diffraction limit, no internal focus, high adjustment precision

Capable of adjusting both beam size and divergence angle of incident laser beams