Femtosecond Laser Micronano Processing Workstation

Specifications
Application
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Product Description
  • Deep Customized Laser Process
  • Optimized Configuration of Laser Light Sources and Various Hardware
  • 100-nanometer to Micron-level Resolution
  • High-Speed and High-Precision Processing
  • Efficient Laser Delivery and Energy Control
  • Optimized Software Control System for All Hardware
The Roban-Nano series Femtosecond Laser Micronano Processing Workstation is an open femtosecond laser processing platform that can customize laser processing techniques and configure laser sources, displacement stages, and other related hardware according to users' requirements. For specific customization details of this system, please contact LBTEK Technical Support.
Attribute
light sourceFemtosecond laser amplifier stage (1030nm/515nm/343nm) optional
Processing MaterialsSemiconductor materials, transparent dielectric materials, metals, optical fibers, polymers, etc.
Processing range (L×W)25×25 mm to 500×500 mm (as per requirement)
Device dimensions (L×W×H)800×600×800 mm
XY-axis repeat positioning accuracy±50 nm to ±5 μm
Z-axis repeat positioning accuracy±100 nm to ±5 μm
Scaning speed0.1-200mm/s (as per requirement)
Processing file formatAeroBasic, supports DXF and STL file conversion
Electrical RequirementsAC200~240 V,50/60 Hz,5 kW
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