The MPG-P1100 differs most significantly from traditional two-photon laser direct writing lithography systems in its use of two processing beams. One beam is a femtosecond laser with a wavelength of 532nm, referred to as the excitation light; the other is a continuous laser with the same 532nm wavelength, called the inhibition light. During processing, a specialized PPI photoresist is used, which exhibits different photosensitive effects to the excitation and inhibition lights: the excitation light induces two-photon polymerization at the irradiated positions to form structures, while the inhibition light disrupts the molecular cross-linking of the photoresist, achieving a depolymerization effect. When the inhibition light is combined with the excitation light, a 3D dark spot is formed through focusing to reduce the equivalent spot size of the excitation light, thereby surpassing the optical diffraction limit and enabling high-precision dual-beam direct writing. The laser direct writing technology based on Peripheral Photon Inhibition (PPI) is an ultra-high-precision three-dimensional direct writing lithography technique. This system utilizes visible light exposure to achieve sub-50nm structural processing, breaking the diffraction limit. It also realizes single-wavelength excitation and inhibition, avoiding chromatic aberration effects, which lays a research foundation for large-area super-resolution writing. With improvements in the system's scanning exposure method, the speed can be increased by at least one order of magnitude compared to the exposure speeds reported in previous literature, enhancing the application potential of PPI direct writing technology.