As the medium and carrier for achieving high-precision peripheral photoinhibition lithography, the ​Polymer-Hybrid Dual-Color Photosensitive Photoresist Series​ plays a critical role in determining lithographic accuracy and quality. Traditional dual-color photosensitive photoresists suffer from multiple issues, including insufficient mechanical strength, inadequate photosensitivity, high volumetric shrinkage, and refractive index mismatch with optical systems. In contrast, the polymer-hybrid dual-color photosensitive photoresist system exhibits enhanced mechanical strength and reduced volumetric shrinkage. Meanwhile, by optimizing resin formulation design and conducting in-depth research on the dual-color photosensitivity mechanism, we have successfully developed a refractive-index-matched photoresist system with high-efficiency dual-color photosensitivity, providing a more reliable solution for high-precision lithography.