High-Power Laser Objectives
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Product Description
- Suitable for focusing or collimating high-power lasers
- Correcting chromatic aberration in the visible spectrum, allowing coaxial observation of the processing surface with the laser beam
- Suitable for 1030-1064 nm laser processing
LBTEK High-Power Laser Objectives are suitable for brightfield observation and near-infrared laser processing. They feature an infinity-corrected plan-apochromatic design, capable of correction from the visible to the near-infrared region. These high-power laser objectives can be used in a variety of applications requiring high power, such as laser cutting or engraving. At lower powers, focused lasers can be used for wafer inspection. They also offer a certain degree of transmission in the visible light band, enabling the use of He-Ne lasers as guide light. The laser processing wavelength range is 1030 nm to 1064 nm, and the mounting thread is an M26 mm × 0.706 mm external thread.
High-Power Laser Objectives
- Suitable for focusing and collimating high-power lasers
- Correcting chromatic aberration in the visible spectrum, allowing coaxial observation of the processing surface with the laser beam
- Suitable for 1030-1064 nm laser processing
- HR-type objectives come with easily replaceable protective glass (1.8mm thickness)
LBTEK offers high-power laser objectives with a wavelength range of 1030 nm to 1064 nm and magnifications of 20X and 50X. The HR objectives offer high resolution and come with a conveniently replaceable 1.8 mm cover glass. Each objective has a 26 mm × 0.706 mm external thread and can be mounted on an internally SM1-threaded mount using the LBTEK SM1-M26A thread adapter. These high-power laser objectives are suitable for brightfield observation.

The objective is mounted in an optics mount using the SM1-M26A thread adapter